1.

Conference Proceedings
Conference Proceedings
1. Advances in process overlay on 300-mm wafers
Staecker, J. ; Arendt, S. ; Schumacher, K. ; Mos, E.C. ; van Haren, R.J. ; van der Schaar, M. ; Edart, R. ; Demmerie, W. ; Tolsma, H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.927-936,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
2.

Conference Proceedings
Conference Proceedings
2. Overlay advanced process control for foundry application
Wan, X. ; Zhou, A. ; Zhang, F. ; Li, J. ; Gu, X. ; Mos, E.C. ; Kisteman, A. ; Wang, V. ; Schuurhuis, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.735-743,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375