1.

Conference Proceedings
Conference Proceedings
1. Influence of mask induced polarization effects on a pattern printability
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.576-586,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Super Self-Aligned Processing for Sub 0.1 μm MOS Devices Using Selective Si l-xGexCVD
Kikuchi, T. ; Yamashiro, T. ; Moriya, A. ; Noda, T. ; Yamamoto, Y. ; Deng, C. ; Sakuraba, M. ; Matsuura, T. ; Murota, J.
Pub. info.: ULSI process integration : proceedings of the first international symposium.  pp.147-156,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-18
3.

Conference Proceedings
Conference Proceedings
3. IN-SITU HEAVY DOPING OF P AND B IN LOW-TEMPERATURE Si 1-X Ge x EPITAXIAL GROWTH USING ULTRACLEAN LPCVD
Murota, J. ; Moriya, A. ; Sakuraba, M. ; Lee, C.J. ; Matsuura, T.
Pub. info.: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.822-833,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-1(1)
4.

Conference Proceedings
Conference Proceedings
4. Low-Temperature Epitaxial Growth of In Situ Heavily B-Doped Si1-xGex Films Using Ultraclean LPCVD
Moriya, A. ; Sakuraba, M. ; Matsuura, T. ; Murota, J. ; Kawashima, I. ; Yabumoto, N.
Pub. info.: Epitaxy and applications of si-based heterostructures : symposium held April 13-17, 1998, San Francisco, California, U.S.A..  pp.349-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 533
5.

Conference Proceedings
Conference Proceedings
5. Current status of 157-nm lithography using a full-field scanner
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1260-1268,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
6.

Conference Proceedings
Conference Proceedings
6. (18.2) 10:35 - 10:55 AM - Ultraclean Hot-Wall LPCVD System Application for Blanket B-doped SiGe(C) and Selective Si Epi
Kunii, Y. ; Inokuchi, Y. ; Moriya, A. ; Kurokawa, H. ; Murota, J. (Hitachi)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1087-1094,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
7.

Technical Paper
Technical Paper
7. Development Status of LoDAN, Health Management System for Space Systems
Akiyama, M. ; Makino, T. ; Morisaki, H. ; Moriya, A. ; Ooya, K.
Pub. info.: AIAA meeting papers on disc.  2005.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit
Ser. no.: 41st
8.

Technical Paper
Technical Paper
8. LoDAN, a Solution for Vehicle Heath Management
Akiyama, M. ; Makino, T. ; Morisaki, H. ; Moriya, A.
Pub. info.: AIAA paper.  2003.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit
Ser. no.: 2003