1.

Conference Proceedings
Conference Proceedings
1. Characterization of deep levels in mesa type HgCdTe IR detector
Yoshino, J. ; Morimoto, J. ; Wada, H. ; Ajisawa, A. ; Kawano, M. ; Oda, N.
Pub. info.: Infrared technology and applications XXIV : 19-24 July 1998, San Diego, California.  Part 1  pp.120-128,  1998.  Bellingham, Wash., USA.  SPIE
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3436
2.

Conference Proceedings
Conference Proceedings
2. MULTI-EXPONENTIAL ANALYSIS OF DLTS BY CONTIN
Morimoto, J. ; Kida, T. ; Miyakawa, T.
Pub. info.: Materials characterization : symposium held April 15-17, 1986, Palo Alto California, U.S.A..  pp.343-348,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 69
3.

Conference Proceedings
Conference Proceedings
3. Thermoelectric Properties of Sintered SiC Doped with Ge
Inai, H. ; Okamoto, Y. ; Morimoto, J.
Pub. info.: Functionally graded materials 1998 : proceedings of the 5th International Symposium on Functionally Graded Materials, held in New Town Hall, Dresden, Germany, October 26-29, 1998.  pp.659-664,  1999.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 308-311
4.

Technical Paper
Technical Paper
4. Improvement of Foot FE Model Based on the Movement of Bones during Heel Impact.
Morimoto, J. ; Yamazaki, K.
Pub. info.: 2004 SAE world congress : technical paper.  2004.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2004
5.

Conference Proceedings
Conference Proceedings
5. Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]
Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Takamizawa, H. ; Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Enomoto, T. ; Sakaguchi, T. ; Nagai, M.
Pub. info.: Photomask Technology 2006.  pp.634936-634936,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Multi-layer resist system for 45-nm-node and beyond: Part III [6349-120]
Abe, Y. ; Morimoto, J. ; Yokoyama, T. ; Kominato, A. ; Ohkubo, Y.
Pub. info.: Photomask Technology 2006.  pp.634935-634935,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Multi-layer resist system for 45-nm-node and beyond: part I [6349-18]
Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Takamizawa, H. ; Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Yokoyama, T. ; Enomoto, T. ; Nagai, M.
Pub. info.: Photomask Technology 2006.  pp.63490I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349