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20 results

Conference Proceedings

1. Trade-off studies on ODUS spectrograph design

Kawashima,T. ; Kuze,A. ; Tanii,J. ; Mori,S. ; Ogawa,T. ; Suzuki,M. ; Shibasaki,K. ; Yamamoto,Y. ; Sano,T.

Pub. info.:	Optical remote sensing of the atmosphere and clouds II : 9-12 October 2000, Sendai, Japan. pp.400-409, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4150

Conference Proceedings

2. Experimental investigation of microwave-enhanced combustion of methane-air mixture for laser application

Cabrido,E.F. ; Itaya,Y. ; Mori,S.

Pub. info.:	XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference : 18-22 September 2000. pp.274-277, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4184

Conference Proceedings

3. Polymer-coated hollow fibers for medical infrared lasers:fabrication,transmission,and end sealing

Shi,Y.-W. ; Abe,Y. ; Mori,S. ; Matsuura,Y. ; Miyagi,M.

Pub. info.:	Biomedical diagnostic, guidance, and surgical-assist systems II : 25-26 January 2000, San Jose, California. pp.268-275, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3911

Conference Proceedings

4. Feasibility study for spaceborne compact FTS and preliminary test results of laboratory model

Kawashima,T. ; Kuze,A. ; Mori,S. ; Suzuki,M. ; Sasano,Y. ; Nakajima,H. ; Chamberland,M.

Pub. info.:	Infrared spaceborne remote sensing VII: 21-23 July 1999, Denver, Colorado. pp.294-304, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3759

Conference Proceedings

5. Recent advantages of bilevel resists based on silsesquioxane for ArF lithography

Morisawa,T. ; Matsuzawa,N.N. ; Mori,S. ; Kaimoto,Y. ; Endo,M. ; Ohfuji,T. ; Kuhara,K. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.484-492, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Theoretical calculations of silylation reaction of photoresists

Matsuzawa,N.N. ; Mori,S. ; Morisawa,T. ; Kaimoto,Y. ; Endo,M. ; Ohfuji,T. ; Kuhara,K. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.493-502, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. High-sensitivity silylation process for 193-nm lithography

Mori,S. ; Kuhara,K. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.146-153, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

8. Performance of the ArF scanning exposure tool

Mori,S.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.522-529, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

9. Negative-tone TSI process for 193-nm lithography

Kuhara,K. ; Mori,S. ; Kaimoto,Y. ; Morisawa,T. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.188-194, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

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Conference Proceedings

10. Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region

Matsuzawa,N.N. ; Mori,S. ; Yano,E. ; Okazaki,S. ; Ishitani,A. ; Dixon,D.A.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.375-384, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

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