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10 results

Conference Proceedings

1. polarization effects: EAPSM vs. TT EAPSM [6281-12]

Morgana, N. ; Conley, W. ; Cangemi, M. ; Cangemi, M. ; Kasprowicz, S. B.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.628109-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

2. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]

Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810T-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

3. Tunable transmission phase mask options for 65/45nm node gate and contact processing

Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1469-1477, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

4. Complementary dipole exposure solutions at 0.29 k1

Heumann, J. ; Schramm, J. ; Birnstein, A. ; Park, K. T. ; Witte, T. ; Morgana, N. ; Hennig, M. ; Pforr, R. ; Thiele, J. ; Schmidt, N. ; Aquino, C.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.327-338, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

5. High transmission mask technology for 45nm node imaging [6154-38]

Conley, W. ; Morgana, N. ; Kasprowicz, B. S. ; Cangemi, M. ; Lassiter, M. ; Litt, L. C. ; Cangemi, M. ; Cottle, R. ; Wu, W. ; Cobb, J. ; Ham, Y. -M. ; Lucas, K. ; Roman, B. ; Progler, C.

Pub. info.:	Optical Microlithography XIX. pp.615411-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

6. Optical properties and process impacts of high transmission EAPSM [6154-40]

Ham, Y. M. ; Morgana, N. ; Sixt, P. ; Cangemin, M. ; Kasprowicz, B. ; Progler, C. ; Martin, P.

Pub. info.:	Optical Microlithography XIX. pp.615413-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

7. High transmission mask technology for 45nm node imaging [6154-50]

Conley, W. ; Morgana, N. ; Kasprowicz B S ; Cangemi M ; Lassiter M ; Litt L C ; Cangemin M ; Cottle R ; Wu W ; Cobb J ; Ham Y M ; Lucas, K. ; Roman, B. ; Porgler, C.

Pub. info.:	Optical Microlithography XIX. pp.61541D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

8. Full-level alternating PSM for sub-100nm DRAM gate patterning

Pforr, R. ; Ahrens, M. ; Dettmann, W. ; Hennig, M. ; Koehle, R. ; Ludwig, B. ; Morgana, N. ; Thiele, J.

Pub. info.:	Optical Microlithography XVI. Part One pp.232-243, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

9. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.415-422, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

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Conference Proceedings

10. Hard phase-shifting masks for the 65-nm node: a performance comparison

Pforr, R. ; Hennig, M. ; Koehle, R. ; Morgana, N. ; Thiele, J. ; Weckesser, J.

Pub. info.:	Optical Microlithography XVII. pp.212-221, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Author: Morgana, N.