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18 results

Conference Proceedings

1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.268-277, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Fluorescence detection of photoacid in chemically amplified resists

Eckert,A.R. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.879-887, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

3. Conducting polyaniline coatings for submicron lithography and SEM metrology

Graham,T.O. ; Angelopoulos,M. ; Furman,B. ; Chen,R.K.-J. ; Moreau,W.M.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.105-113, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

Conference Proceedings

4. Thermal stability of naphthodiazoquinone sensitizers

Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.618-627, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

5. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making

Kwong,R.W. ; Huang,W.-S. ; Hartley,J.G. ; Moreau,W.M. ; Robinson,C. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.352-360, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Defect printing issues with high-contrast chemically amplified resists

Lu,Z.G. ; Moreau,W.M. ; Yin,X. ; Chen,K.-J. ; Thomas,A.C. ; Lawson,P. ; Jordhamo,G.M. ; Wu,C.-H.J.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.136-146, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

7. Acid amplifiers:proton transfer or direct acid formation

Huang,W. ; Kwong,R.W. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.591-597, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

8. Deep-UV hardening of deep-UV resists

Jordhamo,G. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.588-600, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

9. Dissolution behavior of novolak resins

Chen,R.K.-J. ; Jordhamo,G. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.553-562, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

10.

Conference Proceedings

10. Acid diffusion in a chemically amplified negative i-line photoresist

Connolly,J. ; Chen,K.R. ; Kwong,R.W. ; Lawson,M. ; Linehan,L.L. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1124-1131, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

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Author: Moreau,W.M.