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13 results

Conference Proceedings

1. Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application

Seong,N. ; Yeo,G. ; Cho,H. ; Moon,J.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.30-39, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Lithography of 180-nm design rule for 1-Gb DRAM

Nam,D. ; Lee,J. ; Kim,C. ; Choi,S. ; Kang,H. ; Moon,J.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.117-123, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Interfield sampling method dependency of overlay and global alignment

Hong,J. ; Lee,J. ; Cho,H. ; Moon,J. ; Lee,S.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.856-862, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

4. NA optimization of 360-nm and 300-nm pitch devices

Kim,H. ; Kim,S. ; Kim,C. ; Hong,J. ; Lee,J. ; Kang,H. ; Moon,J.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.673-677, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. Patterning 220-nm pitch DRAM patterns by using double mask exposure

Nam,D. ; Seong,N. ; Cho,H. ; Moon,J. ; Lee,S.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.283-292, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Application of phase-edge PSM for narrow logic gate

Kim,B. ; Park,C. ; Ryoo,M. ; Lee,K. ; Cho,H. ; Moon,J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.943-952, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

7. Fabrication of membrane mask for next-generation lithography

Kim,D. ; Lera,J.D. ; Cho,H. ; Moon,J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.255-260, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

8. Pattern asymmetry correction using assist patterns

Ryoo,M. ; Nam,D. ; Cho,H. ; Moon,J. ; Lee,S.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.307-314, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

9. Analysis of imperfections in a micromachined trunable-cavity interferometer

Moon,J. ; Shkel,A.M.

Pub. info.:	Smart structures and materials 2001 : smart electronics and MEMS : 5-7 March, 2001, Newport Beach, USA. pp.46-53, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4334

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Conference Proceedings

10. Measuring flare and its effect on process latitude

Park,J. ; Kang,H. ; Moon,J. ; Lee,M.

Pub. info.:	Optical Microlithography X. pp.708-713, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

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