1.

Conference Proceedings
Conference Proceedings
1. Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing [5853-19]
Kim, S.-K. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.425-431,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]
Ahn, W.-S. ; Kwon, H.-J. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.818-826,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. PSM defect printability of extremely low-k1 sub-130-nm KrF lithography
Cho, W.-I. ; Yeo, G. ; Moon, S.-Y. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1202-1208,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces
Choi, Y.-H. ; Sung, M.-K. ; Lee, S.-H. ; Lee, J.-H. ; Park, J.-H. ; Choi, I.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.351-362,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
5.

Conference Proceedings
Conference Proceedings
5. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.964-971,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Analysis of mask CD error by dose modulation for fogging effect
Lee, H. ; Yang, S.-H. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.143-147,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. New method for approaching the loading-free process for photomask Cr etching
Jang, I.-Y. ; Lee, J.-Y. ; Moon, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.59-65,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
Lee, H. ; Yang, S.-H. ; Park, J.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.666-672,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256