1.

Conference Proceedings
Conference Proceedings
1. Lithographic comparison of assist feature design strategies
Mansfield,S.M. ; Liebmann,L.W. ; Molless,A.F. ; Wong,A.K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.63-76,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Lithographic effects of mask critical dimension error
Wong,A.K. ; Ferguson,R.A. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Neisser,M.O.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.106-116,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Characterization of linewidth variation
Wong,A.K. ; Molless,A.F. ; Brunner,T.A. ; Coker,E. ; Fair,R.H. ; Mack,G.L. ; Mansfield,S.M.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.184-191,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. PHS with inert blocking groups for DUV negative resist
Brunsvold,W.R. ; Conley,W. ; Varanasi,P.R. ; Khojasteh,M. ; Patel,N.M. ; Molless,A.F. ; Neisser,M.O. ; Breyta,G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.372-384,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
5.

Conference Proceedings
Conference Proceedings
5. Simulation and experimental evaluation of double-exposure techniques
Neisser,M.O. ; Molless,A.F.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.372-383,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
6.

Conference Proceedings
Conference Proceedings
6. Characterization of linewidth variation on 248- and 193-nm exposure tools
Gabor,A.H. ; Brunner,T.A. ; Chen,J. ; Chen,N. ; Deshpande,S. ; Ferguson,R.A. ; Horak,D.V. ; Holmes,S.J. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Progler,C.J. ; Rabidoux,P.A. ; Ryan,D. ; Talvi,P. ; Tsou,L. ; Vampatella,B.R. ; Wong,A.K. ; Yang,Q. ; Yu,C.
Pub. info.: Optical Microlithography XIV.  4346  pp.259-264,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. Optimum mask and source patterns to print a given shape
Rosenbluth,A.E. ; Bukofsky,S.J. ; Hibbs,M.S. ; Lai,K. ; Molless,A.F. ; Singh,R.N. ; Wong,A.K.
Pub. info.: Optical Microlithography XIV.  4346  pp.486-502,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations
Wong,A.K. ; Liebmann,L.W. ; Molless,A.F.
Pub. info.: Optical Microlithography XIV.  4346  pp.420-428,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. Method to determine printability of photomask defects and its use in phase-shift mask evaluations
Mansfield,S.M. ; Ferguson,R.A. ; Liebmann,L.W. ; Molless,A.F. ; Wong,A.K.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.651-660,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546