Moffat, T.P. ; Wheeler, D. ; Wjtt., C. ; Jasell, D.
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Copper interconnects, new contact metallurgies, structures, and low-k interlevel dielectrics : proceedings of the internatioal symposium. pp.1-6, 2002. Pennington, N.J.. Electrochemical Society
Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II : proceedings of the international symposium. pp.41-51, 1999. Pennington, N.J.. Electrochemical Society
Moffat, T.P. ; Bonevich, J.E. ; Huber, W.H. ; Stanishevshky, A ; Kelly, D.R. ; Stafford, G.R. ; Josell, D.
Pub. info.:
Electrochemical processing in ULSI fabrication III : proceedings of the international symposium. pp.1-12, 2000. Pennington, N.J.. Electrochemical Society
Electrochemical technology applications in electronics : proceedings of the third international symposium. pp.340-350, 1999. Pennington, NJ. Electrochemical Society