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14 results

Conference Proceedings

1. Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks

Matsumoto,M. ; Abe,T. ; Yokoyama,T. ; Miyashita,H. ; Hayashi,N. ; Sano,H.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.308-321, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Toyama,N. ; Miyashita,H. ; Morikawa,Y. ; Fujita,H. ; Iwase,K. ; Mohri,H. ; Hayashi,N. ; Sano,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.350-358, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Optical disk recording system of 25-GB capacity

Furumiya,S. ; Minamino,J. ; Miyashita,H. ; Nakamura,A. ; Shouji,M. ; Ishida,T. ; Ishibashi,H.

Pub. info.:	Optical data storage 2001 : 22-25 April 2001 Santa Fe, USA. pp.186-193, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4342

Conference Proceedings

4. "Establishment of production processes and assurance method for alternating phase-shift masks (Best Poster Paper, BACUS 2000 Symposium)"

Murai,S.M. ; Koizumi,Y. ; Kamibayashi,T. ; Saitou,H. ; Hoga,M. ; Morikawa,Y. ; Miyashita,H.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.60-72, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

5. Improvement of the efficiency of OPC data handling

Toyama,N. ; Ikemoto,T. ; Ishida,K. ; Miyashita,H.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.612-619, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

6. Development of the falftone phase-shift mask for DUV exposure

Mikami,K. ; Mohri,H. ; Itoh,N. ; Miyashita,H. ; Hayashi,N. ; Sano,H.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.228-242, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

Conference Proceedings

7. Improvement of alt-PSM production process using backside phase-measurement method

Saitou,H. ; Koizumi,Y. ; Sanki,S. ; Kamibayashi,T. ; Murai,S.M. ; Miyashita,H. ; Fujita,H. ; Morikawa,Y. ; Nara,M. ; Hayashi,N. ; Hoga,M.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1087-1095, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

8. Practical phase control technique for alternating phase-shift mask fabrication

Takahashi,M. ; Miyake,A. ; Saitou,H. ; Miyashita,H. ; Murai,S.M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.394-400, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

9. Establishment of production process and assurance method for alternating phase-shift masks

Murai,S.M. ; Koizumi,Y. ; Kamibayashi,T. ; Saitou,H. ; Hoga,M. ; Morikawa,Y. ; Miyashita,H.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.890-901, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

10.

Conference Proceedings

10. Development of photomask process with precise CD control,and an approach for DFM(defect-free manufacturing)using a cluster tool

Sasaki,S. ; Yokoyama,T. ; Kurihara,M. ; Miyashita,H. ; Hayashi,N. ; Sano,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.305-314, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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Author: Miyashita,H.