1.

Conference Proceedings
Conference Proceedings
1. EFFECTS OF BUFFER LAYERS ON PERFORMANCE OF AMORPHOUS SILICON IMAGE SENSORS
Miyagaki, S. ; Ri, S. ; Takasaki, K.
Pub. info.: Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A..  pp.429-434,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 192
2.

Conference Proceedings
Conference Proceedings
2. MOCVD GROWTH OF GaAs ON Si WITH LOW TEMPERATURE PREHEATING PROCESS
Takagi, N. ; Eshita, T. ; Miyagaki, S. ; Kimura, M. ; Takasaki, K.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.305-310,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
3.

Conference Proceedings
Conference Proceedings
3. CRYSTAL QUALITY AND SURFACE MORPHOLOGY IMPROVEMENT OF MOVPE-GROWN GaAs-ON-Si USING TERTIARYBUTYLARSINE
Miyagaki, S. ; Ohkubo, S. ; Takai, K. ; Takagi, N. ; Kimura, M. ; Kikuchi, Y. ; Eshita, T. ; Takasaki, K.
Pub. info.: Semiconductor heterostructures for photonic and electronic applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.345-350,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 281
4.

Conference Proceedings
Conference Proceedings
4. MOVPE GROWTH OF GaAs ON Si USING TERTIARYBUTYLARSINE
Miyagaki, S. ; Ohkubo, S. ; Takai, K. ; Takagi, N. ; Kimura, M. ; Kikuchi, Y. ; Eshita, T. ; Takasaki, K.
Pub. info.: Mechanisms of Heteroepitaxial growth : symposium held April 27-30, 1992, San Francisco, California, U.S.A..  pp.209-214,  1992.  Pittsburgh, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 263
5.

Conference Proceedings
Conference Proceedings
5. Current status of Mo-Si multilayer formation in ASET for low-defect-density mask blanks for EUV lithography [6349-122]
Hiruma, K. ; Tanaka, Y. ; Miyagaki, S. ; Yamanashi, H. ; Nishiyama, I.
Pub. info.: Photomask Technology 2006.  pp.634937-634937,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Performance and quality analysis ofMo-Si multilayers deposited by ion beam sputtering and. magnetron sputtering [6151-68]
Hiruma, K. ; Miyagaki, S. ; Yamanashi, H. ; Cullins, J. ; Nishiyama, I.
Pub. info.: Emerging Lithographic Technologies X.  pp.61511V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
7.

Conference Proceedings
Conference Proceedings
7. Visible-light inspection of EUVL multilayer mask blanks
Hashimoto, T. ; Yamanashi, H. ; Miyagaki, S. ; Nishiyama, I.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.860-869,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446