1.

Conference Proceedings
Conference Proceedings
1. Reticle enhancement verification for the 65nm and 45nm nodes [6156-58]
Lucas, K. ; Patterson, K. ; Boone, R. ; Miramond, C. ; Borjon, A. ; Belledent, J. ; Toublan, O. ; Entradas, J. ; Trouiller, Y.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach
Manakli, S. ; Trouiller. Y. ; Toublan, O. ; Schiavone, P. ; Miramond, C. ; Rody, Y.F. ; Sundermann, F. ; Chapon, J.D. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XV.  Part One  pp.491-502,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. ArF imaging with off-axis illumination and subresolution asist bars: a compromise between mask constraints an lithographic process constraints
Trouiller, Y. ; Serrand, J. ; Miramond, C. ; Rody, Y.F. ; Manakli, S. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1522-1529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Critical failure ORC: application to the 90-nm and 65-nm nodes
Belledent, J. ; Shang, S.D. ; Trouiller, Y. ; Miramond, C. ; Patterson, K. ; Toublan, O.R. ; Couderc, C. ; Sundermann, F. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1184-1197,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Correction of long-range effects applied to the 65-nm node [5853-107]
Belledent, J. ; Word, J. ; Trouiller, Y. ; Couderc, C. ; Miramond, C. ; Toublan, O. ; Chapon, J.-D. ; Baron, S. ; Borjon, A. ; Foussadier, F. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Rody, Y. ; Sundermann, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.202-210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853