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13 results

Conference Proceedings

1. The basis for lithographic modeling (Invited Paper)

Sato, T. ; Endo, A. ; Mimotogi, A. ; Mimotogi, S. ; Sato, K. ; Tanaka, S.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.377-382, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Assessment of wafer pattern prediction accuracy by introducing effectively equivalent mask patterns [6283-118]

Satake, M. ; Mimotogi, A. ; Tanaka, S. ; Mimotogi, S. ; Hashimoto, K. ; Inoue, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

3. Mask enhancement factor for 2D local CD error [5853-59]

Arisawa, Y. ; Mimotogi, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.741-748, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

4. Impact of across-pupil transmittance variation in projection lenses on fine device pattern imaging

Sato, K. ; Mimotogi, S. ; Inoue, S. ; Higashiki, T.

Pub. info.:	Optical Microlithography XVI. Part One pp.33-44, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Enhanced flexible mask specifications

Hasebe, S. ; Nojima, S. ; Mimotogi, S. ; Tanaka, S. ; Ikenaga, O. ; Hashimoto, K. ; Inoue, S. ; Mori, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.593-599, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Effects of local CD error on lithography performance

Mimotogi, S. ; Nojima, S. ; Hasebe, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.575-581, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Novel methodology of employing scatterometry to assess optical proximity correction test pattern

Asano, M. ; Koike, T. ; Mikami, T. ; Abe, H. ; Ikeda, T. ; Tanaka, S. ; Mimotogi, S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XIX. pp.9-18, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5752

Conference Proceedings

8. Flexible mask specifications (Invited Paper)

Nojima, S. ; Mimotogi, S. ; Itoh, M. ; Ikenaga, O. ; Hasebe, S. ; Hashimoto, K. ; Inoue, S. ; Goto, M. ; Mori, I.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.187-196, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

9. Flexible mask specifications

Nojima, S. ; Mimotogi, S. ; Itoh, M. ; Ikenaga, O. ; Hasebe, S. ; Hashimoto, S. ; Inoue, S. ; Goto, M. ; Mori, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.33-42, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

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Conference Proceedings

10. Contact hole formation by multiple exposure technique in ultralow-k1 lithography

Nakamura, H. ; Onishi, Y. ; Sato, K. ; Tanaka, S. ; Mimotogi, S. ; Hashimoto, K. ; Inoue, S.

Pub. info.:	Optical Microlithography XVII. pp.255-263, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Author: Mimotogi, S.