1.

Conference Proceedings
Conference Proceedings
1. Characterization of spatial CD variability,spatial mask-level correction,and improvement of circuit performance
Orshansky,M. ; Milor,L. ; Brodsky,M. ; Nguyen,L. ; Hill,G. ; Peng,Y. ; Hu,C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.602-611,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Modeling of defect propagation/growth for yield impact prediction in VLSI manufacturing
Li,X. ; Strojwas,A.J. ; Swecker,A.L. ; Reddy,M. ; Milor,L. ; Lin,Y.-T.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III.  pp.167-178,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3216
3.

Conference Proceedings
Conference Proceedings
3. Application of rigorous topography simulation for modeling of defect propagation/growth in VLSI fabrication
Li,X. ; Reddy,M. ; Strojwas,A.J. ; Milor,L. ; Lin,Y.T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.322-331,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
4.

Conference Proceedings
Conference Proceedings
4. Proximity effect correction for clock-rate maximization
Chen,L. ; Milor,L. ; Ouyang,C. ; Maly,W.P. ; Peng,Y.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV.  pp.82-93,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3510