1.

Conference Proceedings
Conference Proceedings
1. Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask
Petersen,J.S. ; Williams,A.M. ; Rich,G.K. ; Miller,D.A. ; Martinez,A.M.,Jr.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.375-382,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. 193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
Amblard,G.R. ; Byers,J.D. ; Domke,W.D. ; Rich,G.K. ; Graffenberg,V.L. ; Patel,S. ; Miller,D.A. ; Perez,G.B.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.32-53,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography
Steinhausler,T. ; Gabor,A.H. ; White,D. ; Blakeney,A.J. ; Stark,D.R. ; Miller,D.A. ; Rich,G.K. ; Graffenberg,V.L. ; Dean,K.R.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.122-131,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Experiments of thermomechanical fatigue of SMAS
Lagoudas,D.C. ; Miller,D.A.
Pub. info.: Smart structures and materials 1999 : Smart materials technologies : 3-4 March 1999, Newport Beach, California.  pp.275-282,  1999.  Bellingham.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3675
5.

Conference Proceedings
Conference Proceedings
5. Thermomechanical transformation fatigue of SMA actuators
Lagoudas,D.C. ; Li,C. ; Miller,D.A. ; Rong,L.
Pub. info.: Smart structures and materials 2000 : Active materials : behavior and mechanics : 6-9 March, 2000, Newport Beach, USA.  pp.420-429,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3992
6.

Conference Proceedings
Conference Proceedings
6. Highly absorbing ARC for DUV lithography
Pavelchek,E.K. ; Meador,J.D. ; Guerrero,D.J. ; Lamb,J.E.III ; Kache,A. ; doCanto,M. ; Adams,T.G. ; Stark,D.R. ; Miller,D.A.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.692-699,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
7.

Conference Proceedings
Conference Proceedings
7. Hardmask/BARC materials for 157-nm lithography
Kim,W.D. ; Miller,D.A. ; Kim,H.S. ; Byers,J.D. ; Daniels,M. ; Birmingham,B. ; Tompkins,J.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.93-106,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
8.

Conference Proceedings
Conference Proceedings
8. Transparent resins for 157-nm lithography
Dammel,R.R. ; Sakamuri,R. ; Romano,A.R. ; Vicari,R. ; Hacker,C. ; Conley,W. ; Miller,D.A.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.350-360,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
9.

Conference Proceedings
Conference Proceedings
9. Photoresist outgassing at 157-nm exposure
Hien,S. ; Angood,S. ; Ashworth,D. ; Basset,S. ; Bloomstein,T.M. ; Dean,K.R. ; Kunz,R.R. ; Miller,D.A. ; Patel,S. ; Rich,G.K.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.439-447,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345