1.

Conference Proceedings
Conference Proceedings
1. Thermo-Mechanical Fatigue and Transformation Behavior of TiNiCu SMA
Rong, L.J. ; Miller, D.A. ; Lagoudas, D.C.
Pub. info.: Shape memory materials and its applications : proceedings of the International Conference on Shape Memory and Superelastic Technologies and Shape Memory Materials (SMST-SMM 2001), held in Kunming, China, September 2 to 6 2001.  pp.329-332,  2002.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 394-395
2.

Conference Proceedings
Conference Proceedings
2. Dissolution inhibitors for 157-nm microlithography
Conley, W. ; Miller, D.A. ; Chambers, C.R. ; Osborn, B.P. ; Hung, R.J. ; Tran, H.V. ; Trinque, B.C. ; Pinnow, M.J. ; Chiba, T. ; McDonald, S. ; Zimmerman, P. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.69-75,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Negative photoresist for 157-nm microlithography: a progress report
Conley, W. ; Trinque, B.C. ; Miller, D.A. ; Zimmerman, P. ; Kudo, T. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.94-100,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Aberration determination in early 157-nm exposure system
Smith, B.W. ; Conley, W. ; Garza, C.M. ; Meute, J. ; Miller, D.A. ; Rich, G.K. ; Graffenberg, V. ; Dean, K.R. ; Patel, S. ; Ford, A. ; Foster, J. ; Moers, M.H. ; Cummings, K.D. ; Webb, J.E. ; Dewa, P.G. ; Zerrade, A. ; McDonald, S.S. ; Hughes, G.P. ; Dirksen, P.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1635-1643,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Recent advances in fluorinated resists for application at 157 nm
Houlihan, F.M. ; Sakamuri, R. ; Romano, A. ; Rentkiewicz, D. ; Dammel, R.R. ; Conley, W.E. ; Miller, D.A. ; Sebald, M. ; Stepanenko, N. ; Markert, M. ; Mierau, U. ; Vermeir, I. ; Hohle, C. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.134-150,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Parameter extraction for 157-nm photoresists
Bendik, J.J. ; Conley, W. ; Miller, D.A. ; Zimmerman, P. ; Dean, K.R. ; Petersen, J.S. ; Byers, J.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.988-996,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690