1.

Conference Proceedings
Conference Proceedings
1. Nickel SALICIDE Technology for Sub-100 nm CMOS Devices
Lu, J.P. ; Miles, D. ; Li-Fatou, A. ; Xu, Y.Q. ; Zhao, J. ; Gurba, A. ; Griffin, A., Jr. ; Hornug, B. ; Hewson, M. ; Grider, T. ; Mercer, D. ; Montgomery, C.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.159-173,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
2.

Conference Proceedings
Conference Proceedings
2. 64 Si:C Epitaxial Wafer for Improved Sub-100nm CMOS Transistor Performance
Standley, R. ; Mansoori, M. ; Miles, D. ; Chakravarthi, S. ; Seacrist, M. ; Wise, R. ; Torack, T. ; Ries, M.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.535-541,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05