1.

Conference Proceedings
Conference Proceedings
1. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Comparison of DNQ/novolac resists for e-beam exposure
Fedynyshyn,T.H. ; Doran,S.P. ; Lind,M.L. ; Lyszczarz,T.M. ; DiNatale,W.F. ; Lennon,D. ; Sauer,C.A. ; Meute,J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.600-614,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Aberration evaluation and tolerancing of 193-nm lithographic objective lenses
Smith,B.W. ; Webb,J.E. ; Petersen,J.S. ; Meute,J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.269-280,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334