1.

Conference Proceedings
Conference Proceedings
1. Photomask quality control by Virtual Stepper system for subwavelength photomasks
Karklin,L. ; Mazor,S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.512-517,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. New generation photomasks: 193-nm defect printability study
Karklin,L. ; Adrichem,P.van ; Driessen,F. ; Mazor,S.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.386-393,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562