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18 results

Conference Proceedings

1. Process proximity correction using an automated software tool

Maurer,W. ; Dolainsky,C. ; Thiele,J. ; Friedrich,C. ; Karakatsanis,P.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.245-253, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Benchmarking of software tools for optical proximity correction

Jungmann,A. ; Thiele,J. ; Friedrich,C. ; Pforr,R. ; Maurer,W.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.921-931, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Proximity effects of alternating phase-shift masks

Maurer,W. ; Friedrich,C. ; Mader,L. ; Thiele,J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.344-349, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Evaluating the potential of alternating phase-shift masks using lithography simulation

Friedrich,C. ; Ergenzinger,K. ; Gans,F. ; Crassmann,A. ; Griesinger,U.A. ; Knobloch,J. ; Mader,L. ; Maurer,W. ; Pforr,R.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.590-599, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Integration of alternating phase-shift mask technology into optical proximity correction

Thiele,J. ; Friedrich,C. ; Dolainsky,C. ; Karakatsanis,P. ; Maurer,W.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.548-555, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

6. Application of a new approach to optical proximity correction

Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.639-647, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

7. Mask error enhancement factor

Maurer,W.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.2-7, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

8. Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Friedrich,C. ; Mader,L. ; Erdmann,A. ; List,S. ; Gordon,R.L. ; Kalus,C.K. ; Griesinger,U.A. ; Pforr,R. ; Mathuni,J. ; Ruhl,G.G. ; Maurer,W.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1323-1335, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

9. Pattern transfer at k1=0.5:get 0.25-ｦﾌm lithography ready for manufacturing

Maurer,W. ; Satoh,K. ; Samuels,D.J. ; Fischer,T.

Pub. info.:	Optical Microlithography IX. Part1 pp.113-124, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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Conference Proceedings

10. Application of a simple resist model to fast optical proximity correction

Dolainsky,C. ; Maurer,W.

Pub. info.:	Optical Microlithography X. pp.774-780, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

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Author: Maurer,W.