1.

Conference Proceedings
Conference Proceedings
1. Photochemical Switching of Electrochemistry: Simulation of Visual System
Fujihira, M. ; Nishiyama, K. ; Kurihara, M. ; Matsumura, K.
Pub. info.: Proceedings of the fifth International Symposium on Redox Mechanisms and Interfacial Properties of Molecules of Biological Importance 1993.  pp.373-383,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-11
2.

Conference Proceedings
Conference Proceedings
2. Corrosion Evaluation of Exchange-Biasing Films for M-R Head
Saito, M. ; Yamada, K. ; Matsumura, K.
Pub. info.: Proceedings of the Symposia on Fundamentals of Electrochemical Process Design: a tutorial and Anodic Processes: Fundamental and Applied Aspects.  pp.361-369,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-11
3.

Conference Proceedings
Conference Proceedings
3. Optical pickup for recording to dual-layer 2x-speed Blu-ray disc, DVD, and compact disc [6282-78]
Tanaka, T. ; Sano, K. ; Matsumura, K. ; Wada, H. ; Matsuzaki, K. ; Wakabayashi, k. ; Komma, Y.
Pub. info.: Optical Data Storage 2006 : 23-26 April 2006, Montreal, Canada.  pp.62822C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6282
4.

Conference Proceedings
Conference Proceedings
4. Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics [6349-138]
Tsuji, Y. ; Kikuiri, N. ; Murakami, S. ; Takahara, K. ; Isomura, I. ; Tamura, Y. ; Yamashita, K. ; Hirano, R. ; Tateno, M. ; Matsumura, K. ; Takayama, N. ; Usuda, K.
Pub. info.: Photomask Technology 2006.  pp.63493M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
5.

Conference Proceedings
Conference Proceedings
5. Optical mask inspection strategy for 65-nm node and beyond
Chung, D.-H.P. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.320-329,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. Photomask quality assessment solution for 90-nm technology node
Ohira, K. ; Chung, D.H.P. ; Nobuyuki, Y. ; Tateno, M. ; Matsumura, K. ; Chen, J.-H. ; Luk-Pat, G.T. ; Fukui, N. ; Tanaka, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.364-374,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
8.

Conference Proceedings
Conference Proceedings
8. Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era
Chung, D. -H. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.993-1004,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567