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20 results

Conference Proceedings

1. Thin TiN capped Ti-salicide technology for 0.25 μm CMOS/SIMOX

Matsubara, Y. ; Ohnishi, H. ; Ishigami, T. ; Iguchi, M. ; Nakamura, H. ; Horiuchi, T.

Pub. info.:	Proceedings of the Eighth International Symposium on Silicon-on-Insulator Technology and Devices. pp.110-118, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-23

Conference Proceedings

2. Aluminum Wiring Reliability of Fluorinated Amorphous Carbon Interlayer

Iguchi, M. ; Matsubara, Y. ; Ito, S. ; Endo, K. ; Koyanagi, K. ; Kishimoto, K. ; Gomi, H. ; Tatsumi, T. ; Horiuchi, T.

Pub. info.:	Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.. pp.341-, 1998. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	511

Conference Proceedings

3. Adhesion of a-C:F During Oxygen Plasma Annealing

Matsubara, Y. ; Endo, K. ; Tatsumi, T. ; Horiuchi, T.

Pub. info.:	Low-dielectric constant materials III : symposium held April 1-4, 1997, San Francisco, California, U.S.A.. pp.19-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	476

Conference Proceedings

4. Copper Damascene Using Low-Dielectric Constant Fluorinated Amorphous Carbon Interlayer

Matsubara, Y. ; Endo, K. ; Iguchi, M. ; Ito, N. ; Aoyama, K. ; Tatsumi, T. ; Horiuchi, T.

Pub. info.:	Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.. pp.291-, 1998. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	511

Conference Proceedings

5. Integration Issues for Low-Dielectric Constant Materials in Each Generation of ULSIs

Gomi, H. ; Kishimoto, K. ; Usami, T. ; Koyanagi, K-I. ; Yokoyama, T. ; Oda, N. ; Matsubara, Y.

Pub. info.:	Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.509-, 1999. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	564

Conference Proceedings

6. ACTIVATION ENERGY FOR THE C49-TO-C54 PHASE TRANSITION OF POLYCRYSTALLINE TiSi2 FILMS WITH UNDER 30nm THICKNESS

Matsubara, Y. ; Noguchi, K. ; Okumura, K.

Pub. info.:	Phase transformations in thin films : thermodynamics and kinetics : symposium held April 13-15, 1993, San Francisco, California, U.S.A.. pp.263-, 1993. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	311

Conference Proceedings

7. Magnetic-Field Control of Oxygen Adsorption

Sato, H. ; Matsubara, Y. ; Ozeki, S.

Pub. info.:	Proceedings of the International Conference on Colloid and Surface Science, Tokyo, Japan, November 5-8, 2000 : 25th Anniversary of the Division of Colloid and Surface Chemistry, the Chemical Society of Japan. pp.837-840, 2001. Amsterdam. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	132

Conference Proceedings

8. CMP Technology for the 32-45 nm Node Cu/Low-k Integration (Invited paper)

Kondo, S. ; Yoon, B.U. ; Tokitoh, S. ; Namiki, A. ; Misawa, K. ; Inukai, K. ; Sone, S. ; Shin, H.J. ; Matsubara, Y. ; Ohashi, N. ; Kobayashi, N.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.385-394, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-06

Conference Proceedings

9. Integration Issues for Low-Dielectric Constant Materials in Each Generation of ULSIs

Gomi, H. ; Kishimoto, K. ; Koyanagi, K-I. ; Matsubara, Y. ; Oda, N. ; Usami, T. ; Yokoyama, T.

Pub. info.:	Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A.. pp.161-172, 1999. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	565

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Conference Proceedings

10. Current Status Of Copper Multilevel Interconnects*

Ueno, K. ; Iguchi, M. ; Yokoyama, T. ; Oda, N. ; Miyamoto, H. ; Matsubara, Y. ; Horiuchi, T. ; Saito, S.

Pub. info.:	Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology. pp.1-8, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-17

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