1.

Conference Proceedings
Conference Proceedings
1. Recent Bonded SOI Wafer Thinning Results with Etch Rate Feedback
Neuner, J.W. ; Walsh, J.H. ; Mathur, D.P. ; Poultney, S.K.
Pub. info.: Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications.  pp.559-567,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-36
2.

Conference Proceedings
Conference Proceedings
2. The Role of Thickness Power Spectral Density in Characterizing Bonded SOI Wafers and in Optimizing their Thinning
Poultney, S. ; Robbins, M. ; Gomez, A. ; Mathur, D.P.
Pub. info.: Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications.  pp.321-333,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-36
3.

Conference Proceedings
Conference Proceedings
3. Recent Bonded SOI Wafer Thinning Results with a New Shape Pace Electrode
Neuner, J.W. ; Robbins, M.D. ; Mathur, D.P. ; Poultney, S.K.
Pub. info.: Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications.  pp.334-339,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-36
4.

Conference Proceedings
Conference Proceedings
4. Through the looking glass: what is on the horizon for the mask maker? (Keynote Address)
Mackay, R.S. ; Eynon, B.G., Jr. ; Mathur, D.P.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.1-5,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
5.

Conference Proceedings
Conference Proceedings
5. Application of vector scan electron-beam lithography to 45-nm node extreme-ultraviolet lithography reticles
Walker, D.M. ; Mathur, D.P. ; Su, C. ; Huang, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.872-879,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754