1.

Conference Proceedings
Conference Proceedings
1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology
Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.138-150,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. AFM: a valid reference tool?
Marchman,H.M. ; Dunham,N.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.2-9,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. Subnanometer-precision metrology for 100-nm gate linewidth control
Monahan,K.M. ; MacNaughton,C.W. ; Ng,W. ; Marchman,H.M. ; Schlesinger,J.E.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.110-123,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variation
Monahan,K.M. ; Forcier,R.A. ; Ng,W. ; Kudallur,S. ; Sewell,H. ; Marchman,H.M. ; Schlesinger,J.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.54-67,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
5.

Conference Proceedings
Conference Proceedings
5. Benchmarking multimode CD-SEM metrology to 180 nm
Monahan,K.M. ; Askary,F. ; Elliott,R.C. ; Forcier,R.A. ; Quattrini,R. ; Sheumaker,B.L. ; Yee,J.C. ; Marchman,H.M. ; Bennett,R.D. ; Carlson,S.D. ; Sewell,H. ; McCafferty,D.C. ; Sumra,J. ; Yan,J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.480-493,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
6.

Conference Proceedings
Conference Proceedings
6. Nanometer-scale dimensional metrology with noncontact atomic force microscopy
Marchman,H.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.527-539,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725