1.

Conference Proceedings
Conference Proceedings
1. Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]
Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Takamizawa, H. ; Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Enomoto, T. ; Sakaguchi, T. ; Nagai, M.
Pub. info.: Photomask Technology 2006.  pp.634936-634936,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Multi-layer resist system for 45-nm-node and beyond: part I [6349-18]
Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Takamizawa, H. ; Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Yokoyama, T. ; Enomoto, T. ; Nagai, M.
Pub. info.: Photomask Technology 2006.  pp.63490I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349