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29 results

Conference Proceedings

1. Characterization of laser-induced EUV plasma sources

Kranzusch,S. ; Mann,K.R.

Pub. info.:	Applications of X rays generated from lasers and other bright sources II : 30-31 July 2001, San Diego, USA. pp.114-120, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4504

Conference Proceedings

2. CHARISMA: a new way for angular-resolved scattering measurements

Apel,O. ; Gorling,C. ; Leinhos,U. ; Mann,K.R. ; Schafer,B.

Pub. info.:	Laser-induced damage in optical materials, 2000 : 32nd Annual Boulder Damage Symposium, proceedings, 16-18, October, 2000, Boulder, Colorado. pp.569-578, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4347

Conference Proceedings

3. Characterizing the absorption and aging behavior of DUV optical material by high-resolution excimer laser calorimetry

Mann,K.R. ; Eva,E.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.1055-1061, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

4. Surface finish and optical quality of CaF2 for UV lithography applications

Duparre,A. ; Thielsch,R. ; Kaiser,N. ; Jakobs,S. ; Mann,K.R. ; Eva,E.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.1048-1054, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation

Heber,J. ; Thielsch,R. ; Blaschke,H. ; Kaiser,N. ; Mann,K.R. ; Eva,E. ; Leinhos,U. ; Gortler,A.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.1041-1047, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

6. Characterizing absorption and total scattering losses on optical components for 193-nm wafer steppers

Mann,K.R. ; Apel,O. ; Eva,E.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.1019-1029, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

7. Scatter and absorption losses from DUV optics:a comparative study

Apel,O. ; Mann,K.R.

Pub. info.:	Laser-induced damage in optical materials, 1999 : 31th Annual Boulder Damage Symposium, proceedings, 4-7, October, 1999, Boulder, Colorado. pp.460-469, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3902

Conference Proceedings

8. Nonlinear absorption phenomena in oxide coatings for 193 nm

Apel,O. ; Mann,K.R. ; Heber,J. ; Thielsch,R.

Pub. info.:	Laser-induced damage in optical materials, 1999 : 31th Annual Boulder Damage Symposium, proceedings, 4-7, October, 1999, Boulder, Colorado. pp.235-241, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3902

Conference Proceedings

9. Properties of fluoride DUV excimer laser optics:influence of the number of dielectric layers

Arens,W. ; Ristau,D. ; Ullmann,J. ; Zaczek,C. ; Thielsch,R. ; Kaiser,N. ; Duparre,A. ; Apel,O. ; Mann,K.R. ; Lauth,H. ; Bernitzki,H. ; Ebert,J. ; Schippel,St. ; Heyer,H.

Pub. info.:	Laser-induced damage in optical materials, 1999 : 31th Annual Boulder Damage Symposium, proceedings, 4-7, October, 1999, Boulder, Colorado. pp.250-259, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3902

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Conference Proceedings

10. Long-term test and characterization of optical components at 193 nm and 157 nm

Vogler,K. ; Klaft,I. ; Schroder,T. ; Stamm,U. ; Mann,K.R. ; Apel,O. ; Gorling,C. ; Leinhos,U.

Pub. info.:	Inorganic optical materials II : 1-3 August, 2000, San Diego, USA. pp.255-260, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4102

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