1.

Conference Proceedings
Conference Proceedings
1. Image placement error due to pailern transfer for EUV masks
Masnyj, Z.S. ; Wasson, J.R. ; Lu, B. ; Weisbrod, E. ; Mangat, P.J.S. ; Nordquist, K.J. ; Ainley, E.S. ; Dauksher, W.J. ; Resnick, D.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1150-1154,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Critical dimension and image placement issues for step and flash imprint lithography templates
Nordquist, K.J. ; Mancini, D.P. ; Dauksher, W.J. ; Ainley, E.S. ; Gehoski, K.A. ; Resnick, D.J. ; Masnyj, Z.S. ; Mangat, P.J.S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1143-1149,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. A single-write self-aligned rim-phase-shift process
Garza, C.M. ; Wu, W. ; Roman, B.J. ; Mangat, P.J.S. ; Nordquist, K.J. ; Dauksher, W.J.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.979-985,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
Han, S.-I. ; Weisbrod, E. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.314-330,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
5.

Conference Proceedings
Conference Proceedings
5. Integration of antireflection coatings on EUV absorber stacks
Wasson, J.R. ; Han, S.-I. ; Edwards, N.V. ; Weisbrod, E. ; Dauksher, W.J. ; Mangat, P.J.S. ; Pettibone, D.W.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.382-388,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
Han, S.-I. ; Wasson, J.R. ; Mangat, P.J.S. ; Cobb, J.L. ; Lucas, K. ; Hector, S.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.481-494,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
7.

Conference Proceedings
Conference Proceedings
7. Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials
Han, S.-I. ; Weisbrod, E. ; Wasson, J.R. ; Gregory, R. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J. ; Rosfjord, K.M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.261-270,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
8.

Conference Proceedings
Conference Proceedings
8. Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication
Lu, B. ; Weisbrod, E. ; Mangat, P.J.S. ; Nordquist, K.J. ; Ainley, E.S.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.952-961,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037