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Conference Proceedings

1. Layout-based manufacturability assessment and yield prediction methodology

Simon,P. ; Veelenturf,K. ; Adrichem,P.van ; Jong,J.de ; Sprij,S. ; Maly,W.P.

Pub. info.:	In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.282-288, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3743

Conference Proceedings

2. Chip-scale 3D topography synthesis

Niewczas,M. ; Li,X. ; Strojwas,A.J. ; Maly,W.P.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.785-794, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Accurate prediction of kill ratios based on KLA defect inspection and critical area analysis

Elias,A. ; Strojwas,A.J. ; Maly,W.P. ; Nurani,R.

Pub. info.:	Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II. pp.75-84, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2874

Conference Proceedings

4. Proximity effect correction for clock-rate maximization

Chen,L. ; Milor,L. ; Ouyang,C. ; Maly,W.P. ; Peng,Y.

Pub. info.:	Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV. pp.82-93, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3510