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Conference Proceedings

1. Progress on 300-mm wafer lithography equipment and processes

Mautz,K.E. ; Maltabes,J.G.

Pub. info.:	Micromachining and microfabrication process technology VII : 22-24 October 2001, San Francisco, USA. pp.299-311, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4557

Conference Proceedings

2. Performance of 300-mm lithography tools in a pilot production line

Maltabes,J.G. ; Charles,A.B. ; Hornig,S.R. ; Schedel,T. ; Ganz,D. ; Schmidt,S.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.483-496, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Manufacturability of subwavelength features using reticle and substrate enhancements

McCallum,M. ; Lucas,K.D ; Maltabes,J.G. ; Kling,M.E.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.391-402, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Effect of nonlinear errors on 300-mm wafer overlay performance

Schmidt,S. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Scheurich,J. ; Schedel,T. ; Schuster,R.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.857-865, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Process performance comparisons on 300-mm i-line steppers,DUV stepper,and DUV scanners

Schedel,T. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Schmidt,S. ; Schuster,R.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.335-342, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Is lithography ready for 300 mm?

Charles,A.B. ; Haris,C. ; Hornig,S.R. ; Ganz,D. ; Schedel,T. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Schmidt,S. ; Schuster,R.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.254-264, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

7. Litho clusters with integrated metrology:the next step in continuous flow manufacturing

Stanley,T. ; Maltabes,J.G. ; Mautz,K.E. ; Dougan,J. ; Charles,A.B. ; Garbayo,J.

Pub. info.:	Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California. pp.132-137, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3882

Conference Proceedings

8. Current state of 300-mm lithography in a pilot line environment

Charles,A.B. ; Maltabes,J.G. ; Hornig,S.R. ; Schedel,T. ; Ganz,D. ; Schmidt,S. ; Grant,L. ; Hraschan,G. ; Mautz,K.E. ; Otto,R.

Pub. info.:	Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California. pp.140-153, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3882

Conference Proceedings

9. ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Chen,J.X. ; Riddick,J. ; Lamantia,M. ; Zerrade,A. ; Henderson,P.K. ; Hughes,G.P. ; Tabery,C.E. ; Phan,K.A. ; Spence,C.A. ; Winder,A.A. ; Stanton,B.A. ; Delarosa,E.A. ; Maltabes,J.G. ; Philbin,C.E. ; Chen,J.X. ; Vacca,A. ; Pomeroy,S.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.786-797, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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Conference Proceedings

10. Full-field CD control for sub-0.20-ｦﾌm patterning

Sturtevant,J.L. ; Allgair,J. ; Barrick,M.W. ; Fu,C. ; Green,K.G. ; Hershey,R.R. ; Litt,L.C. ; Maltabes,J.G. ; Nelson,C. ; Roman,B.J. ; Singelyn,J.

Pub. info.:	Optical Microlithography X. pp.137-145, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

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Author: Maltabes,J.G.