1.

Conference Proceedings
Conference Proceedings
1. (13.3) 8:50 - 9:10 AM - Fabrication of Thin Relaxed SiGe Films for Strained Si Applications
Tweet, D. J. ; Maa, J. S. ; Lee, J. J. ; Hsu, S. T. (Sharp Labs. - America)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.865-876,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
2.

Conference Proceedings
Conference Proceedings
2. Relaxation of SiGe Films for the Fabrication of Strained Si Devices
Maa, J. S. ; Tweet, D. J. ; Lee, J. J. ; Hsu, S. T. ; Fujii, K. ; Naka, T. ; Ueda, T. ; Baba, T. ; Awaya, N. ; Sakiyama, K.
Pub. info.: Intergration of heterogeneous thin-film materials and devices : symposium held April 23-24, 2003, San Francisco, California, U.S.A..  pp.3-8,  2003.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 768
3.

Conference Proceedings
Conference Proceedings
3. Relaxation of SiGe Films for the Fabrication of Strained Si Devices
Maa, J. S. ; Tweet, D. J. ; Lee, J. J. ; Hsu, S. T. ; Fujii, K. ; Naka, T. ; Ueda, T. ; Baba, T. ; Awaya, N. ; Sakiyama, K.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.135-140,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765