1.

Conference Proceedings
Conference Proceedings
1. Modeling polarization for hyper-NA lithography tools and masks
K. Lai ; A. E. Rosenbluth ; G. Han ; J. Tirapu-Azpiroz ; J. Meiring ; A. Goehnermeier ; B. Kneer ; M. Totzeck ; L. de Winter ; W. de Boeij ; M. van de Kerkhof
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Pushing the boundary: low-k1 extension by polarized illumination
E. van Setten ; W. de Boeij ; B. Hepp ; N. le Masson ; G. Swinkels ; M. van de Kerkhof
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. Imaging performance optimization for hyper-NA scanner systems in high volume production
M. van de Kerkhof ; E. van Setten ; A. Engelen ; V. Plachecki ; H. Liu
Pub. info.: Optical Microlithography XXI.  2  pp.69241W-1-69241W-13,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924