1.

Conference Proceedings
Conference Proceedings
1. Various factors of the image blur in chemically amplified resist
T. Kawakami ; T. Nagai ; Y. Nishimura ; M. Shima ; S. Kusumoto ; T. Shimokawa
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Process optimization for developer soluble immersion topcoat material
H. Nakagawa ; K. Goto ; M. Shima ; J. Takahashi ; T. Shimokawa ; K. Ichino ; N. Nagatani ; H. Kyoda ; K. Yoshihara
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519