1.

Conference Proceedings
Conference Proceedings
1. Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
M. Dusa ; J. Quaedackers ; O. F. A. Larsen ; J. Meessen ; E. van der Heijden ; G. Dicker ; O. Wismans ; P. de Haas ; K. van I. Schenau ; J. Finders ; B. Vleeming ; G. Storms ; P. Jaenen ; S. Cheng ; M. Maenhoudt
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Alternative process schemes for double patterning that eliminate the intermediate etch step
M. Maenhoudt ; R. Gronheid ; N. Stepanenko ; T. Matsuda ; D. Vangoidsenhoven
Pub. info.: Optical Microlithography XXI.  1  pp.69240P-1-69240P-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
3.

Conference Proceedings
Conference Proceedings
3. A methodology for double patterning compliant split and design
V. Wiaux ; S. Verhaegen ; F. Iwamoto ; M. Maenhoudt ; T. Matsuda
Pub. info.: Lithography Asia 2008.  1  pp.71401X-1-71401X-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
4.

Conference Proceedings
Conference Proceedings
4. Lithography options for the 32nm half pitch node and their implications on resist and material technology
Q. Gronheid ; E. Hendrickx ; V. Wiaux ; M. Maenhoudt ; M. Goethals
Pub. info.: Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China.  pp.68271V-1-68271V-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6827