1.

Conference Proceedings
Conference Proceedings
1. Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
E. Hendrickx ; A. Tritchkov ; K. Sakajiri ; Y. Granik ; M. Kempsell
Pub. info.: Optical Microlithography XXI.  1  pp.69240L-1-69240L-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35
E. Hendrickx ; R. Birkner ; M. Kempsell ; A. Tritchkov ; G. Vandenberghe
Pub. info.: Photomask technology 2008.  1  pp.71221E-1-71221E-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122