1.

Conference Proceedings
Conference Proceedings
1. High throughput maskless lithography: low voltage versus high voltage
S. W. H. K. Steenbrink ; B. J. Kampherbeek ; M. J. Wieland ; J. H. Chen ; S. M. Chang
Pub. info.: Emerging lithographic technologies XII.  1  pp.69211T-1-69211T-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
2.

Conference Proceedings
Conference Proceedings
2. Mapper: high throughput maskless lithography
E. Slot ; M. J. Wieland ; G. de Boer ; P. Kruit ; G. F. ten Berge
Pub. info.: Emerging lithographic technologies XII.  1  pp.69211P-1-69211P-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921