1.

Conference Proceedings
Conference Proceedings
1. Improving lithography intra wafer CD for C045 implant layers using STI thickness feed forward?
J. Massin ; B. Orlando ; M. Gatefait ; J.-D. Chapon ; B. Le-Gratiet
Pub. info.: Optical Microlithography XXI.  3  pp.69244M-1-69244M-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning
J. Dabertrand ; M. Touchet ; S. Kremer ; C. Chaton ; M. Gatefait
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220W-1-69220W-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922