1.

Conference Proceedings
Conference Proceedings
1. Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations
K. Lucas ; C. Cork ; J. Cobb ; B. Ward ; M. Drapeau ; C. Zhang ; J. Allgair ; M. Kling ; M. Rieger
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Automated OPC model collection, cleaning, and calibration flow
M. Drapeau ; B. S. Ward ; B. Falch
Pub. info.: Photomask technology 2008.  1  pp.71221O-1-71221O-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
3.

Conference Proceedings
Conference Proceedings
3. OPC model enhancement using parameter sensitivity methodology
B. S. Ward ; M. Drapeau
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280N-1-70280N-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
4.

Conference Proceedings
Conference Proceedings
4. Double patterning design split implementation and validation for the 32nm node
M. Drapeau ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; T. Machida
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521