S. Consiglio ; R. Mo ; T. Tai ; S. Krishnan ; D. O'Meara ; C. Wajda ; M. Chudzik
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.167-178, 2007. Pennington, NJ. Electrochemical Society
S. Guha ; V. Narayanan ; V. Paruchuri ; B. Linder ; M. Copel ; N. Bojarczuk ; Y. Kim ; M. Chudzik ; Y. Wang ; P. Ronsheim
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment. pp.247-252, 2006. Pennington, NJ. Electrochemical Society