Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.41-52, 2007. Pennington, NJ. Electrochemical Society
Proceedings of ISMSE-12 : 12th International Symposium on Materials in the Space Environment : 24-28 September 2012, Noordwijk, The Netherlands. 2013. Noordwijk, The Netherlands. ESA Communications
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment. pp.427-432, 2008. Pennington, N.J.. Electrochemical Society
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.129-140, 2007. Pennington, NJ. Electrochemical Society