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Conference Proceedings

1. Metrology methods for the quantification of edge roughness

Nelson,C.M. ; Palmateer,S.C. ; Lyszczarz,T.M.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.19-29, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Line-edge roughness in sub-0.18-ｦﾌm resist patterns

Palmateer,S.C. ; Cann,S.G. ; Curtin,J.E. ; Doran,S.P. ; Eriksen,L.M. ; Forte,A.R. ; Kunz,R.R. ; Lyszczarz,T.M. ; Stern,M.B. ; Nelson,C.M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.634-642, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Comparison of DNQ/novolac resists for e-beam exposure

Fedynyshyn,T.H. ; Doran,S.P. ; Lind,M.L. ; Lyszczarz,T.M. ; DiNatale,W.F. ; Lennon,D. ; Sauer,C.A. ; Meute,J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.600-614, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873