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Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.145-152, 2003. Pennington, NJ. Electrochemical Society
De Gendt, S. ; Lux, M. ; Claes, M. ; Van Hoeymissen, J. ; Conrad, T. ; Worth, W. ; Lagrange, S. ; Bergman, E. ; Jassal, A.S. ; Mertens, P.W. ; Heyns, M.M.
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Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.391-398, 1999. Pennington, NJ. Electrochemical Society
Xu, K. ; Vos, R. ; Arnauts, S. ; Lux, M. ; Schaetzlein, W. ; Speh, U. ; Mertens, P. ; Heyns, M. ; Vinckier, C.
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Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.187-194, 2001. Pennington, N.J.. Electrochemical Society
Bailer, W. ; Mayer, H. ; Neuschmied, H. ; Haas, W. ; Lux, M. ; Klieber, W.
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Internet imaging V : 19-20 January 2004, San Jose, California, USA. pp.1-12, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
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Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.537-543, 1995. Pennington, NJ. Electrochemical Society