Search records | 東京工業大学附属図書館文献データベース

Sort order

3 results

Conference Proceedings

1. Defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Morikawa, Y. ; Totsu, Y. ; Nishiguchi, M. ; Hoga, M. ; Hayashi, N. ; Pang, L. ; Luk-Pat, G.T.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.922-934, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

2. Simulation-based defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Pang, L. ; Yu, Z. ; Luk-Pat, G.T. ; Chen, J.X. ; Volk, W.W.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.947-954, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

3. Photomask quality assessment solution for 90-nm technology node

Ohira, K. ; Chung, D.H.P. ; Nobuyuki, Y. ; Tateno, M. ; Matsumura, K. ; Chen, J.-H. ; Luk-Pat, G.T. ; Fukui, N. ; Tanaka, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.364-374, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446