1.

Conference Proceedings
Conference Proceedings
1. Environmental Interactions of the Space Station Freedom Electric Power System
Nahra, H. K. ; Lu, C.Y.
Pub. info.: Proceedings of the European Space Power Conference, Florence, Italy, 2-6 September 1991.  pp.683-688,  1991.  Noordwijk.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 320
2.

Conference Proceedings
Conference Proceedings
2. Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
Lee, T.-K. ; Wang, Y.-C. ; Chi, M. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.346-352,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
3.

Conference Proceedings
Conference Proceedings
3. ULSI Technology and Semiconductor Industry in Taiwan - Prospects and Challenges
Lu, C.Y.
Pub. info.: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.21-29,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-13
4.

Conference Proceedings
Conference Proceedings
4. Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
Lee, T.-K. ; Wang, Y.-C. ; Chi, M.-H. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.450-456,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Pecision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-Цm CMOS technology
Lee, T.-K. ; Wang, Y.-C. ; Chi, M.-H. ; Lu, C.Y. ; Hsieh, C.H. ; Liu, R.G. ; Liao, H.J. ; Yang, S.S. ; Chang, C.-H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.450-456,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040