1.

Conference Proceedings
Conference Proceedings
1. Deposition of Ca+, Na+, Al+, K+ on Single-Crystal Si from DIH2O: NH4OH: H2O2 and DIH2O: HCL: H2O2 as Analyzed by ToF-SIMS and SPV
Debusk, Damon ; Lowell, John ; Reich, Fraser
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.151-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
2.

Conference Proceedings
Conference Proceedings
2. An Optical Approach to Evaluating the Effects of Chlorine on the Quality of Si/SiO2 Interfaces
Sherry, Julia ; Lowell, John ; Hossain, Tim ; DeBusk, Damon
Pub. info.: Materials reliability in microelectronics VI : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.429-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 428
3.

Conference Proceedings
Conference Proceedings
3. CHARACTERIZATION OF SURFACE CLEANS BY SURFACE PHOTO-VOLTAGE AND SURFACE CHARGE IMAGING
Lowell, John ; Wenner, Valerie ; Jastrzebski, Lubek
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.339-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
4.

Conference Proceedings
Conference Proceedings
4. Measuring Diffusion Lengths in Epitaxial Silicon by Surface Photovoltage
Lowell, John ; Wenner, Valerie ; Debusk, Damon
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.207-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386