1.

Conference Proceedings
Conference Proceedings
1. Effect of electrostatic chucking on EUVL mask flatness
Mikkelson, A. R. ; Engelstad, R. L. ; Lovell, E. G. ; Aschke, L. ; Ruggeberg, F. ; Sobel, F.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.120-128,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
2.

Conference Proceedings
Conference Proceedings
2. Predicting microfluidic response during immersion lithography scanning
Wei, A. C. ; Dicks, G. A. ; Abdo, A. Y. ; Nellis, G. F. ; Engelstad, R. L. ; Chang, J. ; Lovell, E. G. ; Beckman, W. A.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.155-163,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
3.

Conference Proceedings
Conference Proceedings
3. Predicting the influence of trapped particles on EUVL reticle distortion during exposure chucking [6349-123]
Romaswamy, V. ; Turner, K. T. ; Engelstad, R. L. ; Lovell, E. G.
Pub. info.: Photomask Technology 2006.  pp.634938-634938,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Simulating the process flow of the Nikon EPL new geometry mask
Chang, J. ; Engelstad, R. L. ; Lovell, E. G. ; Sogard, M. R.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1278-1288,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. Simulating the effects of bake process parameters on resist thermal reflow
Lee, J. -W. ; Feng, Z. ; Engelstad, R. L. ; Lovell, E. G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1228-1239,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
6.

Conference Proceedings
Conference Proceedings
6. Electrostatic chucking and EUVL mask flatness analysis [5992-128]
Nataraju, M. ; Mikkelson, A. ; Sohn, J. ; Engelstad, R. L. ; Lovell, E. G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923S-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Predicting wafer-level IP error due to particle-induced EUVL reticle distortion during exposure chucking [5992-129]
Ramaswamy, V. ; Mikkelson, A. ; Engelstad, R. ; Lovell, E. G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923T-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992