Durand, C. ; Vallee, C. ; Salicia, O. ; Loup, V. ; Bonavalot, M ; Joubert, O. ; Dubourdieu, C.
Pub. info.:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.8-13, 2003. Pennington, N.J.. Electrochemical Society
Rayssac, O. ; Besson, P. ; Loup, V. ; Aulnette, C. ; Favier, S. ; Osternaud, B. ; Portigliatti, L. ; Cayrefourcq, I. (SOITEC)
Pub. info.:
SiGe: materials, processing, and devices : proceedings of the First international symposium. pp.1135-1144, 2004. Pennington, N.J.. Electrochemical Society