Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

16 results

Conference Proceedings

1. Prevention of MoSi multilayer reflection loss in EUVL tools

Meiling,H. ; Mertens,B. ; Stietz,F. ; Wedowski,M. ; Klein,R. ; Kurt,R. ; Louis,E. ; Yakshin,A.E.

Pub. info.:	Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA. pp.93-104, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4506

Conference Proceedings

2. Control of defects in EUV multilayers and demonstration of at-wavelength defect characterization by EUV microscopy

Louis,E. ; den Hartog,M.J.H. ; Maas,E.L.G. ; Bijkerk,F.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.400-405, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

3. Shearing interferometer to characterize EUV optics with a laser plasma source

Visser,M. ; Constantinescu,R.C. ; Hegeman,P. ; Jonkers,J. ; Dekker,M.K. ; Louis,E. ; Hambach,D.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.733-739, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

4. Reflectivity of Mo/Si multilayer systems for EUVL

Louis,E. ; Yakshin,A.E. ; Corts,P.C. ; Abdali,S. ; Maas,E.L.C. ; Stuik,R. ; Bijkerk,F. ; Schmitz,D. ; Scholze,F. ; Ulm,G. ; Haidl,M.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.844-845, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

5. Progress in Mo/Si multilayer coating technology for EUVL optics

Louis,E. ; Yakshin,A.E. ; Gorts,P.C. ; Oestreich,S. ; Stuik,R. ; Maas,E.L.G. ; Kessels,M.J.H. ; Bijkerk,F. ; Haidl,M. ; Mullender,S. ; Mertin,M. ; Schmitz,D. ; Scholze,F. ; Ulm,G.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.406-411, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Deposition and characterization of multilayers on thin foil x-ray mirrors for high-throughput x-ray telescopes

Hussain,A.M. ; Joensen,K.D. ; Hoghoj,P. ; Christensen,F.E. ; Louis,E. ; Voorma,H.J. ; Soong,Y. ; White,N. ; Anderson,I.

Pub. info.:	Multilayer and grazing incidence X-ray/EUV optics III : 5-6 August, 1996, Denver, Colorado. pp.336-346, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2805

Conference Proceedings

7. Mo/Si multiiayer coating technology for EUVL: coating uniformity and time stabllity

Louis,E. ; Yakshin,A.E. ; Gorts,P.C. ; Oestreich,S. ; Maas,E.L.G. ; Kessels,M.J.H. ; Schmitz,D. ; Scholze,F. ; Ulm,G. ; Mullender,S. ; Haidi,M. ; Bijkerk,F.

Pub. info.:	Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA. pp.60-63, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4146

Conference Proceedings

8. New PTB beamlines for high-accuracy EUV reflectometry at BESSY ？

Bijkerk,F. ; Beckhoff,B. ; Brandt,G. ; Fliegauf,R. ; Klein,R. ; Meyer,B. ; Rost,D. ; Schmitz,D. ; Veldkamp,M. ; Weser,J. ; Ulm,G. ; Louis,E. ; Yakshin,A.E. ; Oestreich,S.

Pub. info.:	Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA. pp.72-82, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4146

Conference Proceedings

9. Multilayer reflectance during exposure to EUV radiation

Oestreich,S. ; Klein,R. ; Scholze,F. ; Jonkers,J. ; Louis,E. ; Yakshin,A.E. ; Gorts,P.C. ; Ulm,G. ; Haidl,M. ; Bijkerk,F.

Pub. info.:	Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA. pp.64-71, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4146

10.

Conference Proceedings

10. A differential scanning calorimetry investigation of the black spot defect in anodised extrusions of an Al-Mg-Si alloy(AA 6063)

Garcia-Cordovilla,C. ; Louis,E.

Pub. info.:	Age-hardenable aluminium alloys : proceedings of the fourth international conference held in Balatonfüred, Hungary in May, 1986. pp.301-306, 1987. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	13-14

16 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Louis,E.