1.

Conference Proceedings
Conference Proceedings
1. Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements
Coulombe,S.A. ; Logofatu,P.C. ; Minhas,B.K. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.282-293,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Scatterometry: a metrology for subwavelength surface-relief gratings
Logofatu,P.C. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.472-483,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
3.

Conference Proceedings
Conference Proceedings
3. Measurement precision of optical scatterometry
Logofatu,P.C. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.447-453,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344