1.

Conference Proceedings
Conference Proceedings
1. Alignment performance as a function of chemical mechanical polishing techniques and stepper optimization
Hubbard,B. ; Liu,A.H.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.10-22,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
2.

Conference Proceedings
Conference Proceedings
2. Utilization of optical metrology as an in-line characterization technique for process performance improvement and yield enhancement of dielectric and metal CMP in IC manufacturing
Liu,A.H. ; Solis,R. ; Givens,J.H.
Pub. info.: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.102-111,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3743
3.

Conference Proceedings
Conference Proceedings
3. Defect detection strategies for chemical-mechanical polishing process in shallow-trench isolation applications
Li,J.J. ; Liu,A.H. ; Hiemke,S.S.
Pub. info.: In-Line Methods and Monitors for Process and Yield Improvement.  pp.36-44,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3884